ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,448, issued on Sept. 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Reduction of line wiggling" was invented by Jiann-Horng Lin (Hsinchu, Taiwan), Cheng-Li Fan (New Taipei, Taiwan) and Chih-Hao Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for reducing wiggling in a line includes forming a silicon patterning layer over a substrate and depositing a mask layer over the silicon patterning layer. The mask layer is patterned to form one or more openings therein. The mask layer is thinned and the one or more openings are widened, to provide a smaller height-to-width ratio. The pattern o...