US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 23 for "Photomask inspection method and apparatus thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,744, issued on Sept. 23, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Photomask inspection method and apparatus thereof" was invented by Chih-Wei Wen (Tainan, Taiwan), Hsin-Fu Tseng (Hsinchu County, Taiwan) and Chien-Lin Chen (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An inspection apparatus includes: an inspection apparatus includes: a stage configured to receive a photomask; a radiation source configured to emit a first radiation beam for inspecting the photomask; and an aperture stop configured to receive a second radiation beam reflected from the photomask through an aperture of the ape...