ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,426,229, issued on Sept. 23, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Multipatterning gate processing" was invented by Y. L. Cheng (Tainan, Taiwan), Tzu-Wen Pan (Hsinchu, Taiwan), Yu-Hsien Lin (Kaohsiung, Taiwan) and Ryan Chia-Jen Chen (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for fabricating semiconductor structures are provided. An exemplary method includes forming a first transistor structure and a second transistor structure over a substrate, wherein each transistor structure includes at least one nanosheet. The method further includes depositing a metal over each transistor s...