ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,426,309, issued on Sept. 23, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Method of manufacturing semiconductor devices and semiconductor devices" was invented by Yung-Hsiang Chan (Taichung, Taiwan), An-Hung Tai (Hsinchu, Taiwan), Hui-Chi Chen (Zhudong Township, Taiwan), Jui Fu Chueh (Taipei, Taiwan), Yen-Ta Lin (Taipei, Taiwan), Ming-Chi Huang (Zhubei, Taiwan), Cheng-Chieh Tu (Hsinchu, Taiwan), Jian-Hao Chen (Hsinchu, Taiwan) and Kuo-Feng Yu (Zhudong Township, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In a method of manufacturing a semiconductor device, a gate space is formed by removing a sacrificial...