US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 23 for "CMP system and method of use" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,449, issued on Sept. 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"CMP system and method of use" was invented by Te-Chien Hou (Kaohsiung, Taiwan), Yu-Ting Yen (Kaohsiung, Taiwan), Cheng-Yu Kuo (Zhudong Township, Taiwan), Chih Hung Chen (Hsinchu, Taiwan), William Weilun Hong (Hsinchu, Taiwan) and Kei-Wei Chen (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chemical mechanical planarization (CMP) system including a capacitive deionization module (CDM) for removing ions from a solution and a method for using the same are disclosed. In an embodiment, an apparatus includes a planarization unit for p...