US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 2 for "Photomask, method of fabricating a photomask, and method of fabricating a semiconductor structure using a photomask" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,405,527, issued on Sept. 2, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Photomask, method of fabricating a photomask, and method of fabricating a semiconductor structure using a photomask" was invented by Tzu Han Liu (Tainan, Taiwan), Chih-Wei Wen (Tainan, Taiwan) and Chung-Hung Lin (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a photomask and a method for fabricating a semiconductor structure with a photomask. The photomask includes a substrate, and a polymer layer over a surface of the substrate, wherein the polymer layer includes a thermoplastic polymer and a hyd...