US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 2 for "Methods of servicing photolithographic apparatus" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,405,541, issued on Sept. 2, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Methods of servicing photolithographic apparatus" was invented by Yu-Huan Chen (Hsinchu, Taiwan), Cheng-Hsuan Wu (New Taipei, Taiwan), Ming-Hsun Tsai (Hsinchu, Taiwan), Shang-Chieh Chien (New Taipei, Taiwan) and Li-Jui Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photolithographic apparatus includes a droplet generator, a droplet generator maintenance system, and a controller communicating with the droplet generator maintenance system. The droplet generator maintenance system operatively communicates with the droplet ...