US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 16 for "Tool mismatch reduction using aberration map of the tools" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,864, issued on Sept. 16, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Tool mismatch reduction using aberration map of the tools" was invented by Shih-Chuan Huang (Kaohsiung, Taiwan), Sheng-Min Wang (New Taipei, Taiwan), Shih-Ming Chang (Hsinchu, Taiwan) and Ken-Hsien Hsieh (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a method of tool matching, aberration maps of two or more optical systems of two or more scanner tools are determined. A photoresist pattern is generated by projecting a first layout pattern by an optical system of each one of the two or more scanner tools on a respective subs...