ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,419,102, issued on Sept. 16, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Semiconductor devices" was invented by Shih-Chieh Wu (Hsinchu, Taiwan), Pang-Chi Wu (Hsinchu, Taiwan), Kuo-Yi Chao (Hsinchu, Taiwan), Mei-Yun Wang (Chu-Pei, Taiwan), Hsien-Huang Liao (Hsinchu, Taiwan), Tung-Heng Hsieh (Zhudong Town, Taiwan) and Bao-Ru Young (Zhubei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In an embodiment, a method includes: forming a first fin extending from a substrate; forming a second fin extending from the substrate, the second fin being spaced apart from the first fin by a first distance; forming a metal gate...