US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 16 for "Semiconductor device with trimmed channel region and method of making the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,419,094, issued on Sept. 16, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Semiconductor device with trimmed channel region and method of making the same" was invented by Jia-Chuan You (Hsinchu, Taiwan), Kuan-Ting Pan (Hsinchu, Taiwan), Shi Ning Ju (Hsinchu, Taiwan), Kuo-Cheng Chiang (Hsinchu, Taiwan) and Chih-Hao Wang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes an active area extending in a first direction over a substrate, the active area including at least one conductive path extending from a source region, through a channel region, to a drain region; and a gat...