US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 16 for "Back-end-of-line semiconductor device structure providing a not-gate logic function and methods of forming the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,419,113, issued on Sept. 16, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Back-end-of-line semiconductor device structure providing a not-gate logic function and methods of forming the same" was invented by Yun-Feng Kao (New Taipei, Taiwan) and Katherine H. Chiang (New Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device structure providing a NOT gate logic function includes a layer stack including a pair of semiconductor layers having opposite conductivity-types, and a dielectric isolation layer disposed therebetween. First and second electrodes are located on a first side of the layer...