ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,862, issued on Sept. 16, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Apparatus, system and method" was invented by Po-Han Wang (Hsinchu, Taiwan), Yu-Hsiang Hu (Hsinchu, Taiwan), Hung-Jui Kuo (Hsinchu, Taiwan) and Chen-Hua Yu (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus and a method for effectively exhausting evaporated material are provided. In an embodiment the apparatus includes a hot plate and an exhaust hood assembly suspended over the hot plate. The exhaust hood assembly includes a trench plate, a cover plate over the trench plate and a single exhaust pipe header over and atta...