US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Oct. 7 for "Particle image velocimetry of extreme ultraviolet lithography systems" (Taiwanese Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,164, issued on Oct. 7, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Particle image velocimetry of extreme ultraviolet lithography systems" was invented by En Hao Lai (Hsinchu, Taiwan), Chi Yang (Tainan, Taiwan), Shang-Chieh Chien (New Taipei, Taiwan), Li-Jui Chen (Hsinchu, Taiwan) and Po-Chung Cheng (Longxing Village, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes irradiating a target droplet in an extreme ultraviolet (EUV) light source of an extreme ultraviolet lithography tool with non-ionizing light from a droplet illumination module. The method further includes detecting light reflec...