ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,439,678, issued on Oct. 7, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Isolation structures" was invented by Kai-Hsuan Lee (Hsinchu, Taiwan), Shih-Che Lin (Hsinchu, Taiwan), Po-Yu Huang (Hsinchu, Taiwan), Shih-Chieh Wu (Hsinchu, Taiwan), I-Wen Wu (Hsinchu, Taiwan), Chen-Ming Lee (Taoyuan County, Taiwan), Fu-Kai Yang (Hsinchu, Taiwan) and Mei-Yun Wang (Hsin-Chu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Semiconductor structures and methods are provided. An exemplary method according to the present disclosure includes receiving a fin-shaped structure comprising a first channel region and a second channel ...