US Patent Issued to Taiwan Semiconductor Manufacturing on Oct. 7 for "Image sensor with diffusion barrier structure" (Taiwanese Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,439,709, issued on Oct. 7, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Image sensor with diffusion barrier structure" was invented by Yu-Hung Cheng (Tainan, Taiwan), Ching I Li (Tainan, Taiwan), Chen-Hao Chiang (Jhongli, Taiwan), Eugene I-Chun Chen (Taipei, Taiwan) and Chin-Chia Kuo (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to an integrated chip. The integrated chip includes a sensor semiconductor layer. The sensor semiconductor layer is doped with a first dopant. A photodetector is along a frontside of the sensor semiconductor layer. A backside semiconductor layer is...