ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,457,816, issued on Oct. 28, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Wide channel semiconductor device" was invented by Chia-Yu Wei (Hsinchu, Taiwan), Fu-Cheng Chang (Hsinchu, Taiwan), Hsin-Chi Chen (Hsinchu, Taiwan), Ching-Hung Kao (Hsinchu, Taiwan), Chia-Pin Cheng (Hsinchu, Taiwan), Kuo-Cheng Lee (Hsinchu, Taiwan), Hsun-Ying Huang (Hsinchu, Taiwan) and Yen-Liang Lin (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a plurality of isolation structures, wherein each isolation structure of the plurality of isolation structures is spaced from an adjacent isolation str...