US Patent Issued to Taiwan Semiconductor Manufacturing on Oct. 28 for "Semiconductor device pre-cleaning" (Taiwanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,456,617, issued on Oct. 28, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Semiconductor device pre-cleaning" was invented by Yi-Hsiang Chao (New Taipei, Taiwan), Chih-Sheng Chou (Changhua County, Taiwan), Shu-Ting Yang (Taipei, Taiwan), Ting-Wei Weng (Hsinchu, Taiwan), Peng-Hao Hsu (Hsinchu, Taiwan), Chun-Hsien Huang (Hsinchu, Taiwan), Hung-Hsu Chen (Tainan, Taiwan), Hung-Chang Hsu (Kaohsiung, Taiwan), Chih-Wei Chang (Hsinchu, Taiwan) and Ming-Hsing Tsai (Hsin-Chu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pre-cleaning technique described herein may be used to remove native oxides and/or other contaminants...