ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,259, issued on Oct. 28, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Semiconductor device and manufacturing method thereof" was invented by Wei Lee (Hsinchu, Taiwan), Chung-Liang Cheng (Changhua County, Taiwan), Pei-Wen Liu (Hsinchu, Taiwan), Ke-Wei Su (Hsinchu County, Taiwan) and Kuan-Lun Cheng (Hsin-Chu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a substrate, an interconnect, a second transistor, and a sensing film. The substrate includes devices disposed therein. The interconnect is disposed on the substrate and electrically coupled to the devices, where the interconnec...