ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,443,112, issued on Oct. 14, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Techniques for correction of aberrations" was invented by Min-Cheng Wu (Taitung County, Taiwan) and Ching-Ju Huang (Tainan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Some implementations described herein provide an exposure tool. The exposure tool includes a reticle deformation detector and one or more processors configured to obtain, via the reticle deformation detector, reticle deformation information associated with a reticle during a scanning process for scanning multiple fields of a wafer. The one or more processors determine, bas...