ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,446,276, issued on Oct. 14, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Semiconductor devices and methods of manufacturing thereof" was invented by Hsin-Chieh Huang (Taoyuan, Taiwan), Chia-Cheng Chao (Hsinchu, Taiwan) and Yu-Wen Wang (New Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a first channel structure extending along a first lateral direction and a second channel structure extending along the first lateral direction. The second channel structure is spaced apart from the first channel structure. The semiconductor device further includes a high-k dielectric structu...