US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Oct. 14 for "Metal cut region location method" (Taiwanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,443,782, issued on Oct. 14, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Metal cut region location method" was invented by Jung-Chan Yang (Hsinchu, Taiwan), Ting Yu Chen (Hsinchu, Taiwan), Li-Chun Tien (Hsinchu, Taiwan) and Fong-Yuan Chang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of generating an IC layout diagram includes positioning a cell in the IC layout diagram relative to a first metal layer cut region alignment pattern and overlapping the cell with a first metal layer cut region. The cell includes a first metal layer region corresponding to one of a first or second mask set, t...