ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,461,440, issued on Nov. 4, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Pellicle membrane with improved properties" was invented by Pei-Cheng Hsu (Taipei, Taiwan), Wei-Hao Lee (Taipei, Taiwan), Ting-Pi Sun (Taichung, Taiwan), Chia-Tung Kuo (Hsinchu, Taiwan), Huan-Ling Lee (Hsinchu, Taiwan), Hsin-Chang Lee (Zhubei, Taiwan) and Chin-Hsiang Lin (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A pellicle assembly includes a pellicle membrane with a nanotube layer formed from thick nanotube bundles. The pellicle membrane can be formed with multiple layers and has a combination of long lifetime, high transm...