US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Nov. 4 for "Method of processing liquid containing ammonia nitrogen from semiconductor fabrication machine" (Taiwanese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,459,841, issued on Nov. 4, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method of processing liquid containing ammonia nitrogen from semiconductor fabrication machine" was invented by En Tian Lin (Taoyuan, Taiwan) and Chiao-Ling Weng (Taichung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a method of processing a liquid containing ammonia nitrogen from a first semiconductor fabrication machine. The method includes: adsorbing a plurality of ammonium (NH4+) ions in the liquid; desorbing the plurality of NH4+ ions to a solution; converting a fraction of the plurality of NH4+ ion...