US Patent Issued to Taiwan Semiconductor Manufacturing on Nov. 4 for "Contact plugs and methods forming same" (Taiwanese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,464,751, issued on Nov. 4, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Contact plugs and methods forming same" was invented by Kuo-Hua Pan (Hsinchu, Taiwan), Je-Wei Hsu (Hsinchu, Taiwan), Hua Feng Chen (Hsinchu, Taiwan), Jyun-Ming Lin (Hsinchu, Taiwan), Chen-Huang Peng (Hsinchu, Taiwan), Min-Yann Hsieh (Kaohsiung, Taiwan) and Java Wu (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes forming a transistor, which includes forming a dummy gate stack over a semiconductor region, and forming an Inter-Layer Dielectric (ILD). The dummy gate stack is in the ILD, and the ILD covers a source/drain ...