US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Nov. 4 for "Cleaning method, semiconductor manufacturing method and a system thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,029, issued on Nov. 4, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Cleaning method, semiconductor manufacturing method and a system thereof" was invented by Shao-Chi Wei (Hsinchu, Taiwan) and Hao-Ming Chang (Pingtung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaning method applied in semiconductor manufacturing is provided. The method includes: receiving a substrate having a surface; identifying a location of a particle on the surface of the substrate; moving a cleaning apparatus toward the location of the particle; performing a cleaning operation, thereby removing the particle by spraying a cle...