ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,675, issued on Nov. 25, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Systems and methods for in-situ Marangoni cleaning" was invented by Wei-Chun Hsu (Hsin-Chu, Taiwan), Shu-Yen Wang (Hsin-Chu, Taiwan) and Chui-Ya Peng (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system and method includes: immersing a wafer in a bath within a cleaning chamber; removing the wafer out of the bath through a solvent and into a gas within the cleaning chamber; determining a parameter value from the gas; and performing remediation within the cleaning chamber in response to determining that the parameter value is...