US Patent Issued to Taiwan Semiconductor Manufacturing on Nov. 25 for "Pre-cleaning for a deep trench isolation structure in a pixel sensor" (Taiwanese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,484,327, issued on Nov. 25, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Pre-cleaning for a deep trench isolation structure in a pixel sensor" was invented by Yu-Hung Cheng (Tainan, Taiwan), Yu-Siang Fang (Tainan, Taiwan) and Ching I Li (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cyclic pre-cleaning technique may be used to clean the surfaces of a recess in which a deep trench isolation (DTI) structure is to be formed. The cyclic pre-cleaning technique may include performing one or more deposition and etch cycles to remove oxygen from the surfaces of the recess to reduce the oxygen concentration in...