ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,146, issued on Nov. 18, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Self-aligned scheme for semiconductor device and method of forming the same" was invented by Cai-Ling Wu (Hsinchu, Taiwan), Hsiu-Wen Hsueh (Taichung, Taiwan), Wei-Ren Wang (New Taipei, Taiwan), Po-Hsiang Huang (Taipei, Taiwan), Chii-Ping Chen (Hsinchu, Taiwan) and Jen Hung Wang (Zhubei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In an embodiment, a method includes forming a first conductive feature in a first inter-metal dielectric (IMD) layer; depositing a blocking film over and physically contacting the first conductive feature; depos...