ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,477,835, issued on Nov. 18, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Integrated circuit protection device and method" was invented by Chia-Lin Hsu (Hsinchu, Taiwan) and Yu-Ti Su (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An IC device includes first and second CMOS structures positioned in n-type doped regions of a substrate, the first CMOS structure including a common gate terminal, first NMOS body and source contacts, and first PMOS body and source contacts, the second CMOS structure including a common drain terminal, second NMOS body and source contacts, and second PMOS body and source co...