US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Nov. 18 for "Critical dimension uniformity (CDU) control method and semiconductor substrate processing system" (Taiwanese Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,150, issued on Nov. 18, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Critical dimension uniformity (CDU) control method and semiconductor substrate processing system" was invented by Hsin-Chih Wang (Zhubei, Taiwan), Yu-Tien Shen (Tainan, Taiwan), Yu-Tse Lai (Zhubei, Taiwan), Chih-Kai Yang (Taipei, Taiwan), Hsiang-Ming Chang (Hsinchu, Taiwan), Chun-Yen Chang (Hsinchu, Taiwan) and Ya-Hui Chang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A critical dimension uniformity control method is provided. The method includes gathering a first CDU by a first critical dimension from a first wafer after be...