US Patent Issued to Taiwan Semiconductor Manufacturing on Nov. 11 for "Hard mask layer below via structure in display device" (Taiwanese Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,471,431, issued on Nov. 11, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Hard mask layer below via structure in display device" was invented by Chia-Hua Lin (New Taipei, Taiwan), Hsun-Chung Kuang (Hsinchu, Taiwan), Yu-Hsing Chang (Taipei, Taiwan) and Yao-Wen Chang (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In some embodiments, the present disclosure relates to a display device that includes a reflector electrode coupled to an interconnect structure. An isolation structure is disposed over the reflector electrode, and a transparent electrode is disposed over the isolation structure. Further, an optic...