ALEXANDRIA, Va., June 17 -- United States Patent no. 12,317,529, issued on May 27, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).
"Semiconductor device" was invented by Wei-Sheng Yun (Taipei, Taiwan), Shao-Ming Yu (Hsinchu County, Taiwan), Tung-Ying Lee (Hsinchu, Taiwan) and Chih-Chieh Yeh (Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A device includes a plurality of semiconductor fins extending from a substrate. A plurality of first source/drain regions are epitaxially grown from first regions of the semiconductor fins. Adjacent two of the plurality of first source/drain regions grown from adjacent two of the plurality of semiconductor fins are spaced apart b...