ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,762, issued on May 27, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Self-aligned lines and methods for fabricating the same" was invented by Yong-Jie Wu (Hsinchu, Taiwan), Yen-Chung Ho (Hsinchu, Taiwan), Hui-Hsien Wei (Taoyuan, Taiwan), Chia-Jung Yu (Hsinchu, Taiwan), Pin-Cheng Hsu (Zhubei, Taiwan), Feng-Cheng Yang (Zhudong Township, Taiwan) and Chung-Te Lin (Taiwan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A disclosed method of fabricating a semiconductor structure includes forming a first conductive pattern over a substrate, with the first conductive pattern including a first conductive line and a se...