ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,862, issued on May 27, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Integrated circuit device with improved layout" was invented by Fong-yuan Chang (Hsin-Chu, Taiwan), Chun-Chen Chen (Hsin-Chu, Taiwan), Po-Hsiang Huang (Tainan, Taiwan), Lee-Chung Lu (Taipei, Taiwan), Chung-Te Lin (Tainan, Taiwan), Jerry Chang Jui Kao (Taipei, Taiwan), Sheng-Hsiung Chen (Zhubei, Taiwan) and Chin-Chou Liu (Zhubei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An integrated circuit device includes a device layer having devices spaced in accordance with a predetermined device pitch, a first metal interconnection layer dispo...