US Patent Issued to Taiwan Semiconductor Manufacturing on May 20 for "Isolation structure to increase image sensor performance" (Taiwanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,310,137, issued on May 20, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Isolation structure to increase image sensor performance" was invented by Yen-Ting Chiang (Tainan, Taiwan), Yen-Yu Chen (Kaohsiung, Taiwan), Wen Hao Chang (Yunlin County, Taiwan), Tzu-Hsuan Hsu (Kaohsiung, Taiwan), Feng-Chi Hung (Chu-Bei, Taiwan), Shyh-Fann Ting (Tainan, Taiwan) and Jen-Cheng Liu (Hsin-Chu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Various embodiments of the present disclosure are directed towards an image sensor including a plurality of photodetectors disposed within a substrate. The substrate comprises a front-side su...