US Patent Issued to Taiwan Semiconductor Manufacturing on May 13 for "Semiconductor device with a work function layer having an oxygen-blocking dopant layer" (Taiwanese Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,733, issued on May 13, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Semiconductor device with a work function layer having an oxygen-blocking dopant layer" was invented by Chia-Ching Lee (New Taipei, Taiwan), Hung-Chin Chung (Pingzhen, Taiwan), Chung-Chiang Wu (Taichung, Taiwan), Hsuan-Yu Tung (Keelung, Taiwan), Kuan-Chang Chiu (Hsinchu, Taiwan), Chien-Hao Chen (Chuangwei Township, Taiwan) and Chi On Chui (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device and method of manufacture are provided. In some embodiments a treatment process is utilized to treat a work function layer. Th...