ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,635, issued on May 13, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Semiconductor device having functional patterns in redundant regions of double seal ring" was invented by Shan-Yu Huang (Zhubei, Taiwan), Yilun Chen (Hsinchu, Taiwan) and Huang-Sheng Lin (Hsin-Chu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes a first circuit region; a first inner seal ring at least partially surrounding the first circuit region; and an outer seal ring at least partially surrounding the first inner seal ring. The outer seal ring includes a first corner and a substantially triangular co...