US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on May 13 for "Reduced area standard cell abutment configurations" (Taiwanese Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,299,373, issued on May 13, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Reduced area standard cell abutment configurations" was invented by Chi-Yu Lu (Hsinchu, Taiwan), Hui-Zhong Zhuang (Hsinchu, Taiwan), Pin-Dai Sue (Hsinchu, Taiwan), Yi-Hsin Ko (Hsinchu, Taiwan) and Li-Chun Tien (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of designing a semiconductor device including the operations of analyzing a vertical abutment between a first standard cell block and a second cell block and, if a mismatch is identified between the first standard cell block and the second cell block initiating the s...