ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,472, issued on May 13, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsin-Chu, Taiwan).
"Plasma processing apparatus and method" was invented by Pei-Yu Lee (Taoyuan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus for semiconductor processing includes an injector holder configured to removably mate with a structure defining an interior chamber of a plasma processing apparatus. The injector holder defines a first opening. A sleeve is configured to be received within the first opening, and the sleeve defines a second opening. A gas injector is configured to be received within the second opening of the...