ALEXANDRIA, Va., June 12 -- United States Patent no. 12,298,673, issued on May 13, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Method of manufacturing photo masks" was invented by Chien-Cheng Chen (Hsinchu County, Taiwan), Chia-Jen Chen (Jhudong Township, Taiwan), Hsin-Chang Lee (Zhubei, Taiwan), Shih-Ming Chang (Hsinchu, Taiwan), Tran-Hui Shen (Dounan Township, Taiwan), Yen-Cheng Ho (Taichung, Taiwan) and Chen-Shao Hsu (Changhua County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In a method of manufacturing a photo mask for lithography, circuit pattern data are acquired. A pattern density, which is a total pattern area per predetermined area, is calculated ...