ALEXANDRIA, Va., June 12 -- United States Patent no. 12,298,667, issued on May 13, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Lithography" was invented by Meng-Che Tu (Hsinchu, Taiwan), Po-Han Wang (Hsinchu, Taiwan), Sih-Hao Liao (New Taipei, Taiwan), Yu-Hsiang Hu (Hsinchu, Taiwan) and Hung-Jui Kuo (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes the following steps. A photoresist is exposed to a first light-exposure through a first mask, wherein the first mask includes a first stitching region, and a first portion of the photoresist corresponding to a first opaque portion of the first stitching region is unexposed. The photoresist is expo...