US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on May 13 for "Filter membrane and method for making the same" (Taiwanese Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,296,303, issued on May 13, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Filter membrane and method for making the same" was invented by En-Tian Lin (Hsinchu, Taiwan) and Chwen Yu (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for making a filter membrane includes: forming a polymer layer; applying a plurality of nanoparticles on the polymer layer, the nanoparticles being self-assembled to form a closed pack arrangement on the polymer layer; heating the nanoparticles such that a portion of the polymer layer contacting the nanoparticles is softened so that the nanoparticles are sunk into the...