US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on March 4 for "Method for removing particles from pellicle and photomask" (Taiwanese Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,182, issued on March 4, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method for removing particles from pellicle and photomask" was invented by Tzu Han Liu (Tainan, Taiwan), Chih-Wei Wen (Tainan, Taiwan) and Chung-Hung Lin (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a method for removing particles. The method includes: receiving a pellicle including a pellicle membrane, wherein a particle is disposed on the pellicle membrane; passing a light beam through an object lens, wherein the light beam is focused on a focal region in front of the pellicle membrane by the...