ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,788, issued on March 4, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Method and system for generating layout design of integrated circuit" was invented by Shih-Yao Lin (Hsinchu, Taiwan), Yi-Lin Chuang (Taipei, Taiwan), Yin-An Chen (Hsinchu, Taiwan) and Shih Feng Hong (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes providing a placing layout of the integrated circuit; generating a routed layout including a layout region with a systematic design rule check (DRC) violation; and performing a loop when the DRC the systematic DRC violation exists. The loop includes: generating an adj...