US Patent Issued to Taiwan Semiconductor Manufacturing on March 4 for "Conditioner disk, chemical mechanical polishing device, and method" (Taiwanese Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,240,076, issued on March 4, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Conditioner disk, chemical mechanical polishing device, and method" was invented by Hsien Hua Shen (Hsinchu, Taiwan) and Hsun-Chung Kuang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pad conditioner for conditioning a polishing surface of a polishing pad includes a conditioning disk, a disk holder, and a disk arm. The conditioning disk includes a substrate plate and at least two abrasive segments. The conditioning disk includes at least one channel by which debris and spent slurry may be evacuated. The abrasive segments are on...