US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on March 25 for "Silicon-based optical device and method of fabricating the same" (Taiwanese, American Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,604, issued on March 25, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Silicon-based optical device and method of fabricating the same" was invented by Wen-Shun Lo (Hsinchu County, Taiwan), Jing-Hwang Yang (Hsinchu County, Taiwan) and Yingkit Felix Tsui (Cupertino, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of fabricating an optical device comprises steps of forming a silicon-based optical component in a substrate; depositing an ILD layer on the substrate and the silicon-based optical component; forming a thermal tuning assembly comprising a first metallic material in the ILD layer and above...