US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on March 25 for "Method and apparatus for revitalizing plasma processing tools" (Taiwanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,026, issued on March 25, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method and apparatus for revitalizing plasma processing tools" was invented by Chi-Hsing Lin (Hsinchu, Taiwan), Chen-Fon Chang (Hsinchu, Taiwan), Chun-Yi Wu (Hsinchu, Taiwan), Shi-Yu Ke (Hsinchu, Taiwan) and Chih-Teng Liao (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for revitalizing components of a plasma processing apparatus that includes a sensor for detecting a thickness or roughness of a peeling weakness layer on a protective surface coating of a plasma processing tool and/or for detecting airborne contaminant...