US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on March 25 for "Cleaning method for photo masks and apparatus therefor" (Taiwanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,649, issued on March 25, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Cleaning method for photo masks and apparatus therefor" was invented by Hsin-Chang Lee (Zhubei, Taiwan), Pei-Cheng Hsu (Taipei, Taiwan), Hao-Ping Cheng (Taichung, Taiwan) and Ta-Cheng Lien (Cyonglin Township, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a method of cleaning a photo mask, the photo mask is placed on a support such that a pattered surface faces down, and an adhesive sheet is applied to edges of a backside surface of the photo mask."

The patent was filed on Nov. 22, 2023, under Application No. 18/517,828.

*For fur...