US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on March 18 for "Critical dimension uniformity" (Taiwanese Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,254,258, issued on March 18, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).

"Critical dimension uniformity" was invented by Chi-Ta Lu (Sanxing Township, Taiwan) and Chi-Ming Tsai (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes receiving a pattern layout for a mask, shrinking the pattern layout to form a shrunk pattern, determining centerlines for each of a plurality of features within the shrunk pattern, and snapping the centerline for each of the plurality of features to a grid. The grid represents a minimum resolution size of a mask fabrication tool. The method further includes, after s...