US Patent Issued to Taiwan Semiconductor Manufacturing on June 3 for "Semiconductor devices devices including crystallized layer having multiple crystalline orientations and methods of manufacture" (Taiwanese Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,595, issued on June 3, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Semiconductor devices devices including crystallized layer having multiple crystalline orientations and methods of manufacture" was invented by Chun-Yen Peng (Hsinchu, Taiwan), Te-Yang Lai (Hsinchu, Taiwan), Sai-Hooi Yeong (Zhubei, Taiwan) and Chi On Chui (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a crystalline high-k dielectric layer and controlling the crystalline phase and orientation of the crystal growth of the high-k dielectric layer during an anneal process. The crystalline phase and orientation of th...